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RF-CF4 plasma surface modification of paper: Chemical evaluation of two sidedness with XPS/ATR-FTIR
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RF-CF4 plasma surface modification of paper: Chemical evaluation of two sidedness with XPS/ATR-FTIR
Sahin, Hahl Turgut
URI:
http://acikerisim.sdu.edu.tr/xmlui/handle/123456789/89896
Description:
The study was performed to examine the correlation between the initial roughness and surface fluorination of paper under RF-CF4 plasma environment.
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