| dc.creator |
Kiristi, Melek |
|
| dc.creator |
Gulec, Ali |
|
| dc.creator |
Bozduman, Ferhat |
|
| dc.creator |
ÖKSÜZ, Lütfi |
|
| dc.creator |
Oksuz, Aysegul Uygun |
|
| dc.creator |
Hala, Ahmed |
|
| dc.date |
2014-09-29T21:00:00Z |
|
| dc.date.accessioned |
2020-10-06T10:14:46Z |
|
| dc.date.available |
2020-10-06T10:14:46Z |
|
| dc.identifier |
5911f491-8134-4f31-97f4-b852cf6e0a39 |
|
| dc.identifier |
10.1016/j.tsf.2014.07.035 |
|
| dc.identifier |
https://avesis.sdu.edu.tr/publication/details/5911f491-8134-4f31-97f4-b852cf6e0a39/oai |
|
| dc.identifier.uri |
http://acikerisim.sdu.edu.tr/xmlui/handle/123456789/60799 |
|
| dc.description |
Electron beam and radio frequency (RF: 13.56 MHz) magnetron sputtering methods were used to obtain a highly transparent and conductive indium tin oxide (ITO) films. The coated thin films were treated by RF-H2O plasma in order to improve optical and electrical properties. RF-H2O plasma characteristics were investigated by optical emission spectroscopy during surface treatments. X-ray photoelectron spectroscopy results on O 1s core levels indicated the activated oxygen species in both amorphous and crystalline ITO structures. The structural, electrical and optical properties of ITO film were characterized by scanning electron microscopy, X-ray diffraction, and four-probe techniques. After the RF-H2O plasma treatment, the ITO films exhibited lower resistivity and better transparency due to the formation of radical species. (C) 2014 Elsevier B.V. All rights reserved. |
|
| dc.language |
eng |
|
| dc.rights |
info:eu-repo/semantics/closedAccess |
|
| dc.title |
Radio frequency-H2O plasma treatment on indium tin oxide films produced by electron beam and radio frequency magnetron sputtering methods |
|
| dc.type |
info:eu-repo/semantics/article |
|