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Atmospheric pressure plasma deposition of polyfuran

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dc.creator Gok, Aysegul
dc.creator Oksuz, Lutfi
dc.date 2007-09-30T21:00:00Z
dc.date.accessioned 2020-10-06T11:23:49Z
dc.date.available 2020-10-06T11:23:49Z
dc.identifier cc5e82f9-3960-4172-b9e3-28d69d436f67
dc.identifier 10.1080/10601320701524021
dc.identifier https://avesis.sdu.edu.tr/publication/details/cc5e82f9-3960-4172-b9e3-28d69d436f67/oai
dc.identifier.uri http://acikerisim.sdu.edu.tr/xmlui/handle/123456789/72242
dc.description The atmospheric pressure radiofrequency (RF) plasma polymerization of furan was carried out with the objective of synthesizing polyfuran thin film. The structure, compositions and morphology of the plasma deposited polyfuran film were investigated by Fourier transform infrared (FTIR), atomic force microscopy (AFM), ultraviolet-visible absorption spectroscopy (UV-vis) and thermogravimetric analysis (TGA). The formation of polyfuran was confirmed using FTIR and UV-visible analysis. The properties of plasma-deposited polyfuran were compared with those of chemically synthesized polyfuran. Although the plasma deposited thin film polyfuran shows lower thermal stability than that of chemically synthesized polyfuran. It has better solubility in CHCl3, also. Thin uniform polyfuran films are obtained in plasma assisted polyfuran deposition, while particles are obtained in chemical polyfuran polymerization.
dc.language eng
dc.rights info:eu-repo/semantics/closedAccess
dc.title Atmospheric pressure plasma deposition of polyfuran
dc.type info:eu-repo/semantics/article


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