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NH3 sensing properties of nanostructure ZnO thin film prepared by silar method

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dc.creator Karaduman, Irmak
dc.creator Acar, Selim
dc.creator ATEŞ, AYTUNÇ
dc.creator YILDIRIM, MEMET ALİ
dc.creator Corlu, Tuğba
dc.date 2016-12-31T21:00:00Z
dc.date.accessioned 2020-10-06T11:50:18Z
dc.date.available 2020-10-06T11:50:18Z
dc.identifier ef6a5f42-cebf-4cdf-9791-111548b53056
dc.identifier https://avesis.sdu.edu.tr/publication/details/ef6a5f42-cebf-4cdf-9791-111548b53056/oai
dc.identifier.uri http://acikerisim.sdu.edu.tr/xmlui/handle/123456789/75700
dc.description Ammonia (NH3) sensing characteristics of nanostructure ZnO thin film prepared by Successive Ionic Layer Adsorption and Reaction (SILAR) method are discussed in this paper. The structural and morphological characterizations of the film are performed by X-ray diffractometer (XRD) and Scanning Electron Microscope (SEM). The gas sensing characteristics have been studied by exposing the film to various concentrations of NH3 at different operating temperatures within the range of 37-77 degrees C. The nanostructured ZnO thin film has exhibited maximum gas response to 100 ppm NH3 gas exposure at 77 degrees C operating temperature.
dc.language eng
dc.rights info:eu-repo/semantics/closedAccess
dc.title NH3 sensing properties of nanostructure ZnO thin film prepared by silar method
dc.type info:eu-repo/semantics/article


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