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A combined approach to the simulation of ionizing radiation effects in silicon devices

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dc.creator Meroli, S.
dc.creator Servoli, L.
dc.creator Placidi, P.
dc.creator Passeri, D.
dc.creator Ozkorucuklu, S.
dc.creator Alpat, B.
dc.creator Mencaroni, A.
dc.creator Pilicer, E.
dc.creator Ozdemir, T.
dc.date 2011-05-01T00:00:00Z
dc.date.accessioned 2021-12-03T11:14:25Z
dc.date.available 2021-12-03T11:14:25Z
dc.identifier 029ad160-ac63-46fe-989c-2e9c5647986e
dc.identifier 10.1088/1748-0221/6/05/t05001
dc.identifier https://avesis.sdu.edu.tr/publication/details/029ad160-ac63-46fe-989c-2e9c5647986e/oai
dc.identifier.uri http://acikerisim.sdu.edu.tr/xmlui/handle/123456789/89678
dc.description Silicon devices (both pixels and microstrips) have been widely used in the past years in High Energy Physics experiments and also in other applications involving the detection of ionizing radiation such as medical imaging and dosimetry. The simulation of the silicon devices response to ionizing radiation is an important step needed to understand the performances in terms of signal, noise, spatial and energy resolution as a function of several technology parameters like doping profile, geometrical dimensions, bias voltage. These simulations are routinely carried out using two separate approaches (and tools): radiation interaction with a geometrically segmented silicon material (GEANT4, FLUKA, PENELOPE) taking into account the physical processes and giving as output the deposited energy; transport of generated electron/hole pairs through the device with electronic signal formation (SENTAURUS-TCAD). In this work we propose a new combined approach using both methods, applied to the case of CMOS pixel sensor, to obtain a better understanding of the behavior of the devices.
dc.language eng
dc.rights info:eu-repo/semantics/closedAccess
dc.title A combined approach to the simulation of ionizing radiation effects in silicon devices
dc.type info:eu-repo/semantics/article


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