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Surface sulfonation of paper in SO2+O-2 plasmas - Hypotheses on reaction mechanisms

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dc.creator Sahin, H. Turgut
dc.creator Young, Raymond A.
dc.date 2008-01-01T01:00:00Z
dc.date.accessioned 2021-12-03T11:31:14Z
dc.date.available 2021-12-03T11:31:14Z
dc.identifier 7f69ea7f-bfdc-4c81-bced-0f619f9b14e6
dc.identifier https://avesis.sdu.edu.tr/publication/details/7f69ea7f-bfdc-4c81-bced-0f619f9b14e6/oai
dc.identifier.uri http://acikerisim.sdu.edu.tr/xmlui/handle/123456789/92973
dc.description A new approach to deposit sulfur groups on paper has been evaluated in this study by radio-frequency (RF) SO2+O-2 plasma treatment. The survey and high-energy resolution XPS spectra provide clues to the site of modification on the paper surface. Relatively large variations in the deposited film-like layer composition can be realized by changing plasma parameters. In general, increasing RF-power provides effective implantation of sulfur, from 3.6% to 7.2%. It is clearly shown that elemental oxygen incorporation on paper directly depends on the relative ratio Of SO2/O-2.
dc.language eng
dc.rights info:eu-repo/semantics/closedAccess
dc.title Surface sulfonation of paper in SO2+O-2 plasmas - Hypotheses on reaction mechanisms
dc.type info:eu-repo/semantics/article


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